Non-ferrous Metals
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Rare Earth Elements
Tungsten Alloy Targets
Made of ultra-high purity raw materials, our tungsten and tungsten alloy sputtering targets have full density and uniform grain size. Our tungsten alloy targets can provide high sputtering efficiency, uniform film thickness, and smooth erosion. They are widely used for semiconductors, thin film solar cells, and FPD. The most popular products are tungsten titanium sputtering targets and tungsten silicon sputtering targets with different compositions.
Specification for tungsten alloy sputtering targets
| Product | Item code | W (wt%) | Ti (wt%) | Si (wt%) |
Purity (wt%) |
Density (%) |
Grain Size (µm) |
Ra (µm) |
Inquiry |
|---|---|---|---|---|---|---|---|---|---|
| Tungsten targets | WT74-4N5 | 100 | / | / | 99.995 | ≥99 | <50 | ≤1.6 | Inquiry |
| Tungsten targets | WT74-5N | 100 | / | / | 99.999 | ≥99 | <50 | ≤1.6 | Inquiry |
| Tungsten titanium targets | WTi10 | 90 | 10 | / | 99.9-99.999 | ≥99 | <10 | ≤1.6 | Inquiry |
| Tungsten titanium targets | WTi20 | 80 | 20 | / | 99.9-99.995 | ≥99 | <10 | ≤1.6 | Inquiry |
| Tungsten silicon targets | WSi10 | 90 | / | 10 | 99.9-99.999 | ≥99 | <10 | ≤1.6 | Inquiry |
| Tungsten silicon targets | WSi20 | 80 | / | 20 | 99.9-99.999 | ≥99 | <10 | ≤1.6 | Inquiry |
For more information on Edgetech Industries deposition materials, please visit us at Sputtering targets and Evaporation Materials.