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Non-ferrous Metals

Deposition Materials

Rare Earth Elements

Semiconductor Elements

Functional Materials

Tungsten Alloy Targets

Made of ultra-high purity raw materials, our tungsten and tungsten alloy sputtering targets have full density and uniform grain size. Our tungsten alloy targets can provide high sputtering efficiency, uniform film thickness and smooth erosion. They are widely used for semiconductor, thin film solar cell and FPD. Most popular products are tungsten titanium sputtering targets and tungsten silicon sputtering targets with different compositions.

Specification for tungsten alloy sputtering targets

Product Item code W (wt%) Ti (wt%) Si (wt%) Purity
(wt%)
Density
(%)
Grain Size (µm) Ra
(µm)
Inquiry
Tungsten target WT74-4N5 100 / / 99.995 ≥99 <50 ≤1.6 Inquiry
Tungsten target WT74-5N 100 / / 99.999 ≥99 <50 ≤1.6 Inquiry
Tungsten titanium target WTi10 90 10 / 99.9-99.999 ≥99 <10 ≤1.6 Inquiry
Tungsten titanium target WTi20 80 20 / 99.9-99.995 ≥99 <10 ≤1.6 Inquiry
Tungsten silicon target WSi10 90 / 10 99.9-99.999 ≥99 <10 ≤1.6 Inquiry
Tungsten silicon target WSi20 80 / 20 99.9-99.999 ≥99 <10 ≤1.6 Inquiry

For more information on Edgetech Industries deposition materials, please visit us at Sputtering targets and Evaporation Materials.

 

 

 

 

 

 

 

 

 

 

 

 

 



EdgeTech Industries LLC16518 SW 36th St, Miramar, FL 33027sales@edge-techind.com